Apparatus for and method of optical component alignment

ABSTRACT

Apparatus for and method of aligning optical components such as mirrors to facilitate proper beam alignment using an image integration optical system is used to integrate images from multiple optical features such as from both left mirror bank and right mirror bank to present the images simultaneously to the camera system. A fluorescent material may be used to render a beam footprint visible and the relative positions of the footprint and an alignment feature may be used to align the optical feature.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.18/020,718, which is the national phase of PCT/US2021/045324, filed Aug.10, 2021, which claims priority to U.S. Application No. 63/072,390,filed Aug. 31, 2020, titled APPARATUS FOR AND METHOD OF OPTICALCOMPONENT ALIGNMENT, each of which is incorporated herein in itsentirety by reference.

FIELD

The present disclosure relates to systems and methods for aligningoptical components for use, for example, in a lithographic apparatus,and particularly to components in optical pulse stretchers useful forlengthening the pulse of the output of a laser source.

BACKGROUND

A lithographic apparatus applies a desired pattern onto a substrate suchas a wafer of semiconductor material, usually onto a target portion ofthe substrate. A patterning device, which is alternatively referred toas a mask or a reticle, may be used to generate a circuit pattern to beformed on an individual layer of the wafer. Transfer of the pattern istypically accomplished by imaging onto a layer of radiation-sensitivematerial (resist) provided on the substrate. In general, a singlesubstrate will contain adjacent target portions that are successivelypatterned.

Lithographic apparatus include so-called steppers, in which each targetportion is irradiated by exposing an entire pattern onto the targetportion at one time, and so-called scanners, in which each targetportion is irradiated by scanning the pattern through a radiation beamin a given direction (the “scanning” direction) while synchronouslyscanning the substrate parallel or anti-parallel to this direction. Itis also possible to transfer the pattern from the patterning device tothe substrate by imprinting the pattern onto the substrate. Herein, forthe sake of simplicity, both steppers and scanners will be referred tosimply as scanners.

The light source used to illuminate the pattern and project it onto thesubstrate can be of any one of a number of configurations. Deepultraviolet excimer lasers commonly used in lithography systems includethe krypton fluoride (KrF) laser at 248 nm wavelength and the argonfluoride (ArF) laser at 193 nm wavelength. The laser source can includean optical pulse stretcher for lengthening the pulse of the output of ahigh power gas discharge laser system.

Newer requirements for lithography scanner performance necessitate alonger pulse length, measured in terms of the time integral square (TIS)of the pulse length. For example, improving the Edge Placement Error(EPE) of a chip feature requires a longer TIS. An optical pulsestretcher (OPuS) is used to stretch the pulses to achieve the desiredTIS. Increasing TIS requires a larger OPuS. Increasing the size of theOPuS makes is even more critical that the components of the OPuS are inproper optical alignment.

A conventional method of aligning the components of an OPuS entailsopening the OPuS enclosure and physically positioning a target card nearthe optical surface of a component being aligned. The incoming beam isthen aligned based on the landing position of the beam of the targetcard. The target card is then shifted to the next optical componentrequiring alignment and so on until all of the optical componentsrequiring alignment have been properly aligned.

This alignment process, which may be referred to as open beam papertarget alignment, requires opening up the sealed laser enclosure forcard placement. It entails the risks of open beam operation and must beexecuted very carefully to avoid exposing the skin of the individualperforming the alignment to UV radiation. It is also time consuming andrequires an extensive amount of manipulation and other manual operation.It exposes the optical surfaces being aligned to contamination and canresult in a reduction of optical life of critical optical component. Itis also difficult to achieve accurate alignment due to the complexity ofestablishing the beam alignment target and subjective judgment of beamposition.

SUMMARY

The following presents a concise summary of one or more embodiments inorder to provide a basic understanding of the embodiments. This summaryis not an extensive overview of all contemplated embodiments and is notintended to identify key or critical elements of all embodiments nordelineate the scope of any or all embodiments. Its sole purpose is topresent some concepts of one or more embodiments in a simplified form asa prelude to the more detailed description that is presented later.

According to an aspect of an embodiment, a camera system is used tomonitor the beam position on OpuS components such as mirrors tofacilitate proper beam alignment. In some embodiments an imageintegration optical system is used to integrate images from multipleoptical features such as from both left mirror bank and right mirrorbank to present the images simultaneously to the camera system. Thissimplifies the design and avoids the cost of having multiple cameras toinspect the features separately. According to an aspect of anembodiment, the camera system is installed outside the purge volume ofOPuS enclosure to mitigate the risks of open beam operation and avoidbreaking purge. As used herein, the term “camera” is intended toencompass any device, system, or arrangement for capturing (converting)an image.

According to aspects of an embodiment, during alignment the landingposition of the beam as revealed by a “florescence footprint” ispositioned to be coincident with or overlap an alignment feature of acomponent being aligned. For example, where the optical component is adichroic mirror within the OPuS, the alignment feature may be placed onthe back support plate through the dichroic mirror to facilitate beampositioning.

Thus, according to some embodiments, use of the camera system minimizesthe amount of open beam operation required during alignment. Thissignificantly improves the safety of the alignment procedure. Also, thenon-contact nature of this alignment system reduces the risks inherentin direct close optics handling including the risk of surfacecontamination. The system also makes possible a significant reduction inthe field service time of the OPuS module due to elimination of the needto open the enclosure and break purge, and of manual target positioning.

According to an aspect of an embodiment there is disclosed an opticalcomponent comprising a sealed enclosure, the sealed enclosure includinga window transparent to visible light, a first optical featurepositioned at a first position within the enclosure, a second opticalfeature positioned at a second position within the enclosure, and animage integration module arranged to receive first optical feature lightfrom the first optical feature and second optical feature light from thesecond optical feature and adapted to redirect the first optical featurelight and the second optical feature light through the window to form animage from the first optical feature light collocated with an image fromthe second optical feature light. The optical component may be anoptical pulse stretcher. The first optical feature may comprise a firstmirror and the second optical feature may comprise a second mirror. Thefirst mirror may comprise a first concave dichroic mirror and the secondmirror may comprise a second concave dichroic mirror. The first opticalfeature and the second optical feature may be positioned substantiallysymmetrically with respect to the image integration module.

According to another aspect of an embodiment the image integrationmodule may comprise a first reflective surface arranged to redirectlight from the first optical feature and a second reflective surfacearranged to redirect light from the second optical surface. The firstreflective surface may comprise a first prism reflective surface of afirst prism and the second reflective surface may comprise a secondprism reflective surface of a second prism. The image integration modulemay comprise a prism having a first reflective surface oriented towardthe first optical feature and a second reflective surface orientedtoward the second optical feature. The image integration module maycomprise two flat beveled mirrors.

According to another aspect of an embodiment the optical component mayfurther comprise a third optical feature positioned at a third positionwithin the enclosure and a fourth optical feature positioned at a fourthposition within the enclosure, and the image integration module may bearranged to receive third optical feature light from the third opticalfeature and fourth optical feature light from the fourth optical featureand adapted to combine and redirect the third optical feature light andthe fourth optical feature light through the window to form an imagefrom the third optical feature light adjacent to an image from thefourth optical feature light.

According to another aspect of an embodiment the optical component mayfurther comprise a camera system arranged to receive the first opticalfeature light and the second optical feature light through the window.The camera system may comprise a lens system arranged to receive thefirst optical feature light and the second optical feature light throughthe window and a camera arranged to receive the first optical featurelight and the second optical feature light from the lens system. Theoptical component as may further comprise a folding mirror opticallypositioned between the image integration module and the window forturning an optical path of the first optical feature light and thesecond optical feature light.

According to another aspect of an embodiment at least one of the firstoptical feature and the second optical feature may be adjustable and mayfurther comprise an actuator mechanically coupled to the at least one ofthe first optical feature and the second optical feature to adjust anorientation of the at least one of the first optical feature and thesecond optical feature.

According to another aspect of an embodiment the first optical featuremay comprise a first fluorescent material and a first alignment featureand the second optical feature may comprise a second fluorescentmaterial and a second alignment feature. The first optical feature maycomprise a first mirror comprising a first substrate transparent tovisible light and first reflective coating that is reflective to UVradiation and a first mirror support, and the second optical feature maycomprise a second mirror comprising a second substrate transparent tovisible light and second reflective coating that is reflective to UVradiation and a second mirror support. The first mirror support maycomprise a first alignment feature on a front surface of the firstmirror support and the second mirror support may comprise a secondalignment feature on a front surface of the second mirror support. Thefirst alignment feature may correspond to a position of an aligned beamfootprint on the first mirror and the second alignment feature maycorrespond to a position of an aligned beam footprint on the secondmirror.

According to another aspect of an embodiment the first optical featuremay comprise a first reflective coating including the first fluorescentmaterial and the second optical feature may comprise a second reflectivecoating including the second fluorescent material. The first fluorescentmaterial may be provided on a back surface of the first substrate andthe second fluorescent material may be provided on a back surface of thesecond substrate. The first fluorescent material may be provided on afront surface of the first mirror support and the second fluorescentmaterial may be provided on a front surface of the second mirrorsupport. The first mirror support may comprise the first fluorescentmaterial and the second mirror support may comprise the secondfluorescent material.

According to another aspect of an embodiment there is disclosed anoptical component comprising a sealed enclosure, the sealed enclosureincluding a window transparent to visible light, a first optical featurepositioned within a first field of view within the enclosure, a secondoptical feature positioned within the first field of view within theenclosure, and an image integration module arranged to receive firstfield of view light from the first field of view and adapted to combineand redirect the first field of view light through the window, and theimage integration module may comprise a planar mirrored surface inclinedwith respect to a line passing through a center of the planar mirroredsurface and substantially parallel to the first field of view by anangle θ given by the relationship

$\theta = {45 + {\left\lbrack {{a{\tan\left\lbrack \frac{\frac{h}{2} - \frac{w}{2\sqrt{2}}}{s} \right\rbrack}} - {a{\tan\left( \frac{d}{s} \right)}}} \right\rbrack/2.}}$

where h is a height of the first field of view, d is a vertical distancebetween the center of the first field of view to the center of theplanar mirrored surface, and s is a horizontal distance between thefirst field of view and the center of the planar mirrored surface.

According to another aspect of an embodiment there is disclosed a methodof aligning a plurality of optical features arranged in sealed enclosurehaving a window, the method comprising combining light from each of theoptical features to produce a combined light signal, directing thecombined light signal out of the enclosure through the window, andaligning at least some of the plurality of optical features based atleast in part on the combined light signal. The method may furthercomprise imaging the combined light signal after directing the combinedlight signal out of the enclosure through the window using a camerasystem positioned outside of the sealed enclosure and arranged toreceive the combined light signal. Each of the plurality of opticalfeatures may comprise an alignment feature and a fluorescent materialarranged to generate a visible footprint of a UV beam impinging on theoptical feature and the method may further comprise, before combininglight from each of the optical features to produce a combined lightsignal, exposing each of the optical features to a beam of UV radiation,and generating an illuminated footprint of the beam of UV radiation oneach of the optical features, and aligning at least some of theplurality of optical features based at least in part on the combinedlight signal may comprise aligning at least some of the plurality ofoptical features based at least in part on a positional relationship ofthe illuminated footprint and the alignment feature for each opticalfeature. The aligning may comprise adjusting of one or more of theplurality of optical features. Adjusting one or more of the plurality ofoptical features may comprise manually operating one or more actuatorsrespectively mechanically coupled to the one or more of the plurality ofoptical features. Adjusting one or more of the plurality of opticalfeatures may comprise supplying a signal to actuate one or more motordriven actuators respectively mechanically coupled to the one or more ofthe plurality of optical features. Adjusting one or more of theplurality of optical features may comprise adjusting an orientation ofone or more of the plurality of optical features.

Further features and advantages of the present invention, as well as thestructure and operation of various embodiments of the present invention,are described in detail below with reference to the accompanyingdrawings. It is noted that the present invention is not limited to thespecific embodiments described herein. Such embodiments are presentedherein for illustrative purposes only. Additional embodiments will beapparent to persons skilled in the relevant art(s) based on theteachings contained herein.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated herein and form partof the specification, illustrate the methods and systems of embodimentsof the invention by way of example, and not by way of limitation.Together with the detailed description, the drawings further serve toexplain the principles of and to enable a person skilled in the relevantart(s) to make and use the methods and systems presented herein. In thedrawings, like reference numbers indicate identical or functionallysimilar elements.

FIG. 1 shows a schematic, not to scale, view of an overall broadconception of a photolithography system according to an aspect of thedisclosed subject matter.

FIG. 2 shows a schematic, not to scale, view of an overall broadconception of a laser system used in a lithography system according toan aspect of the disclosed subject matter.

FIG. 3 is a diagram of an optical pulse stretcher according to an aspectof the disclosed subject matter.

FIG. 4 is a diagram showing various light paths within an optical pulsestretcher according to an aspect of the disclosed subject matter.

FIGS. 5A and 5B are diagrams showing various light paths within anoptical pulse stretcher according to an aspect of the disclosed subjectmatter.

FIG. 6 is a partially perspective view of the arrangement of mirrors inone side of an optical pulse stretcher according to an aspect of thedisclosed subject matter.

FIG. 7 is a diagram showing a conventional method of aligning opticalfeatures within an optical component.

FIGS. 8A and 8B are diagrams showing a system for aligning opticalfeatures according to an aspect of the disclosed subject matter.

FIG. 9A is a diagram showing a system for aligning optical featuresaccording to an aspect of the disclosed subject matter.

FIG. 9B is a diagram showing image collocation in a system for aligningoptical features according to an aspect of the disclosed subject matter.

FIG. 10 is a diagram illustrating the conditions for achieving maximalfield of view according to an aspect of the disclosed subject matter.

FIGS. 11A and 11B show alternative components for an image integrationmodule according to an aspect of the disclosed subject matter.

FIG. 11C is a diagram showing the effects of placement of componentswithin the optical image integration module on field of view accordingto an aspect of the disclosed subject matter.

FIG. 12A is a diagram showing a system for aligning optical featuresaccording to an aspect of the disclosed subject matter.

FIG. 12B is a diagram showing image collocation in a system for aligningoptical features according to an aspect of the disclosed subject matter.

FIGS. 13A, 13B, 13C, and 13D show aspects of the structure of opticalfeatures according to aspects of the disclosed subject matter.

FIGS. 14A, 14B, 14C, and 14D show aspects of the structure of opticalfeatures according to aspects of the disclosed subject matter.

FIGS. 15A and 15B show the relative positioning of a UV footprint and analignment mark before and after an alignment process, respectively,according to an aspect of the disclosed subject matter.

FIG. 16 is a flow chart illustrating a method of aligning opticalfeatures in optical component according to an aspect of the disclosedsubject matter.

Further features and advantages of the invention, as well as thestructure and operation of various embodiments of the invention, aredescribed in detail below with reference to the accompanying drawings.It is noted that the invention is not limited to the specificembodiments described herein. Such embodiments are presented herein forillustrative purposes only. Additional embodiments will be apparent topersons skilled in the relevant art based on the teachings containedherein.

DETAILED DESCRIPTION

This specification discloses one or more embodiments that incorporatethe features of this invention. The disclosed embodiment(s) merelyexemplify the present invention. The scope of the present invention isnot limited to the disclosed embodiment(s). The present invention isdefined by the claims appended hereto.

The embodiment(s) described, and references in the specification to “oneembodiment”, “an embodiment”, “an example embodiment”, “an exemplaryembodiment”, etc., indicate that the embodiment(s) described may includea particular feature, structure, or characteristic, but every embodimentmay not necessarily include the particular feature, structure, orcharacteristic. Moreover, such phrases are not necessarily referring tothe same embodiment. Further, when a particular feature, structure, orcharacteristic is described in connection with an embodiment, it isunderstood that it is within the knowledge of one skilled in the art toeffect such feature, structure, or characteristic in connection withother embodiments whether or not explicitly described.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“on,” “upper,” “left,” “right” and the like, may be used herein for easeof description to describe one element's or feature's relationship toanother element(s) or feature(s) as illustrated in the figures. Thespatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the figures. The apparatus may be otherwiseoriented (rotated 90 degrees or at other orientations) and the spatiallyrelative descriptors used herein may likewise be interpretedaccordingly.

Before describing specific embodiments in more detail, it is instructiveto present an example environment in which embodiments of the presentinvention may be implemented. Referring to FIG. 1 , a photolithographysystem 100 includes an illumination system 105. As described more fullybelow, the illumination system 105 includes a light source that producesa pulsed light beam 110 and directs it to a photolithography exposureapparatus or scanner 115 that patterns microelectronic features on awafer 120. The wafer 120 is placed on a wafer table 125 constructed tohold wafer 120 and connected to a positioner (not shown) configured toaccurately position the wafer 120 in accordance with certain parameters.

The photolithography system 100 uses a light beam 110 having awavelength in the deep ultraviolet (DUV) range, for example, withwavelengths of 248 nanometers (nm) or 193 nm. The minimum size of themicroelectronic features that can be patterned on the wafer 120 dependson the wavelength of the light beam 110, with a lower wavelengthpermitting a smaller minimum feature size. When the wavelength of thelight beam 110 is 248 nm or 193 nm, the minimum size of themicroelectronic features can be, for example, 50 nm or less. Thebandwidth of the light beam 110 can be the actual, instantaneousbandwidth of its optical spectrum (or emission spectrum), which containsinformation on how the optical energy of the light beam 110 isdistributed over different wavelengths. The scanner 115 includes anoptical arrangement having, for example, one or more condenser lenses, amask, and an objective arrangement. The mask is movable along one ormore directions, such as along an optical axis of the light beam 110 orin a plane that is perpendicular to the optical axis. The objectivearrangement includes a projection lens and enables the image transfer tooccur from the mask to the photoresist on the wafer 120. Theillumination system 105 adjusts the range of angles for the light beam110 impinging on the mask. The illumination system 105 also homogenizes(makes uniform) the intensity distribution of the light beam 110 acrossthe mask.

The scanner 115 can include, among other features, a lithographycontroller 130, air conditioning devices, and power supplies for thevarious electrical components. The lithography controller 130 controlshow layers are printed on the wafer 120. The lithography controller 130includes a memory that stores information such as process recipes. Aprocess program or recipe determines the length of the exposure on thewafer 120 based on, for example, the mask used as well as other factorsthat affect the exposure. During lithography, a plurality of pulses ofthe light beam 110 illuminate the same area of the wafer 120 toconstitute an illumination dose.

The photolithography system 100 also preferably includes a controlsystem 135. In general, the control system 135 includes one or more ofdigital electronic circuitry, computer hardware, firmware, and software.The control system 135 also includes memory which can be read-onlymemory and/or random access memory. Storage devices suitable fortangibly embodying computer program instructions and data include allforms of non-volatile memory, including, by way of example,semiconductor memory devices, such as EPROM, EEPROM, and flash memorydevices; magnetic disks such as internal hard disks and removable disks;magneto-optical disks; and CD-ROM disks.

The control system 135 can also include one or more input devices (suchas a keyboard, touch screen, microphone, mouse, hand-held input device,etc.) and one or more output devices (such as a speaker or a monitor).The control system 135 may also include one or more programmableprocessors, and one or more computer program products tangibly embodiedin a machine-readable storage device for execution by one or moreprogrammable processors. The one or more programmable processors caneach execute a program of instructions to perform desired functions byoperating on input data and generating appropriate output. Generally,the processors receive instructions and data from the memory. Any of theforegoing may be supplemented by, or incorporated in, specially designedASICs (application-specific integrated circuits). The control system 135can be centralized or be partially or wholly distributed throughout thephotolithography system 100.

Referring to FIG. 2 , an exemplary laser source system within theillumination system 105 is a pulsed laser source that produces a pulsedlaser beam as the light beam 110. FIG. 2 shows illustratively and inblock diagram a gas discharge laser system according to an embodiment ofcertain aspects of the disclosed subject matter. The gas discharge lasersystem may include, e.g., a solid state or gas discharge seed lasersystem 140, an amplification stage, e.g., a power ring amplifier (“PRA”)stage 145, relay optics 150 and laser system output subsystem 160. Theseed system 140 may include, e.g., a master oscillator (“MO”) chamber165.

The seed laser system 140 may also include a master oscillator outputcoupler (“MO OC”) 175, which may comprise a partially reflective mirror,forming with a reflective grating (not shown) in a line narrowing module(“LNM”) 170, an oscillator cavity in which the seed laser 140 oscillatesto form the seed laser output pulse, i.e., forming a master oscillator(“MO”). The system may also include a line-center analysis module(“LAM”) 180. The LAM 180 may include an etalon spectrometer for finewavelength measurement and a coarser resolution grating spectrometer. AMO wavefront engineering box (“WEB”) 185 may serve to redirect theoutput of the MO seed laser system 140 toward the amplification stage145, and may include, e.g., beam expansion with, e.g., a multi prismbeam expander (not shown) and coherence busting, e.g., in the form of anoptical delay path (not shown).

The amplification stage 145 may include, e.g., a PRA lasing chamber 200,which may also be an oscillator, e.g., formed by seed beam injection andoutput coupling optics (not shown) that may be incorporated into a PRAWEB 210 and may be redirected back through the gain medium in thechamber 200 by a beam reverser 220. The PRA WEB 210 may incorporate apartially reflective input/output coupler (not shown) and a maximallyreflective mirror for the nominal operating wavelength (e.g., at around193 nm for an ArF system) and one or more prisms.

A bandwidth analysis module (“BAM”) 230 at the output of theamplification stage 145 may receive the output laser light beam ofpulses from the amplification stage and pick off a portion of the lightbeam for metrology purposes, e.g., to measure the output bandwidth andpulse energy. The laser output light beam of pulses then passes throughan optical pulse stretcher (“OPuS”) 240 and an output combinedautoshutter metrology module (“CASMM”) 250, which may also be thelocation of a pulse energy meter. One purpose of the OPuS 240 may be,e.g., to convert a single output laser pulse into a pulse train.Secondary pulses created from the original single output pulse may bedelayed with respect to each other. By distributing the original laserpulse energy into a train of secondary pulses, the effective pulselength of the laser can be expanded and at the same time the peak pulseintensity reduced. The OPuS 240 can thus receive the laser beam from thePRA WEB 210 via the BAM 230 and direct the output of the OPuS 240 to theCASMM 250. Other suitable arrangements may be used in other embodiments.

The PRA lasing chamber 200 and the MO 165 are configured as chambers inwhich electrical discharges between electrodes may cause lasing gasdischarges in a lasing gas to create an inverted population of highenergy molecules, including, e.g., Ar, Kr, and/or Xe, to producerelatively broad band radiation that may be line narrowed to arelatively very narrow bandwidth and center wavelength selected in aline narrowing module (“LNM”) 170, as is known in the art.

Typically, the tuning takes place in the LNM. A typical technique usedfor line narrowing and tuning of lasers is to provide a window at theback of the laser's discharge cavity through which a portion of thelaser beam passes into the LNM. There, the portion of the beam isexpanded with a prism beam expander and directed to a grating whichreflects a narrow selected portion of the laser's broader spectrum backinto the discharge chamber where it is amplified. The laser is typicallytuned by changing the angle at which the beam illuminates the gratingusing an actuator such as, for example, a piezoelectric actuator.

In operation, the OPuS 240 stretches the excimer or other gas dischargelaser, e.g., a molecular fluorine gas discharge laser, having a givenpulse duration and TIS to a longer pulse having several peaks and alarger TIS.

FIG. 3 is a schematic diagram of front view of an example of an opticalpulse stretcher 401 having first optical pulse stretcher 401 a andsecond optical pulse stretcher 401 b, according to some embodiments ofthe present disclosure. The optical pulse stretcher 401 receives inputbeam pulse 411 and stretches it to output a stretched output beam pulse413.

According to some embodiments, and as discussed in more detail below,second optical pulse stretcher 401 b can include two or more (forexample, three) stages of confocal optical pulse stretchers.

In some examples, these three stages of confocal optical pulse stretchercan be positioned approximately parallel to each other in second opticalpulse stretcher 401 b. In some embodiments, second optical pulsestretcher 401 b can be positioned perpendicular or approximatelyperpendicular to first optical pulse stretcher 401 a. In other words, insome embodiments, first optical pulse stretcher 401 a (e.g., anorthogonal optical pulse stretcher that may be positioned vertically) ispositioned perpendicular or approximately perpendicular to the two ormore (for example, three) stages of confocal optical pulse stretchers ofsecond optical pulse stretcher 401 b which is positioned vertically inthe figure. According to some embodiments, second optical pulsestretcher 401 b is designed such that it provides additional opticaldelay.

According to some embodiments, the extended optical pulse stretcher 401combines two or more confocal optical pulse stretchers. For example,extended optical pulse stretcher 401 combines confocal optical pulsestretchers in the combination of 4 reflections, 4 reflections, 12reflections, and 12 reflections per optical circuit configuration.According to some embodiments, the inclusion of the combination ofdifferent mirror separations and delay path lengths (e.g., 4 reflectionsand 12 reflections delay lengths) can result in very long pulsestretching and minimal efficiency losses.

According to some embodiments, second optical pulse stretcher 401 b caninclude three stages of confocal optical pulse stretchers. However, theembodiments of this disclosure are not limited to these examples, andsecond optical pulse stretcher 401 b can include other numbers of stagesof confocal optical pulse stretchers. In some examples, the first stageof second optical pulse stretcher 401 b is discussed as having twomirrors. However, the embodiments of this disclosure are not limited tothese examples and the first stage of second optical pulse stretcher 401b can include other numbers (for example two or more) and/orconfigurations of mirrors. In some examples, the plurality of mirrorsused in the first stage of second optical pulse stretcher 401 b areconfigured to generate four reflections of the laser beam between them.

In some examples, the second stage of second optical pulse stretcher 401b is discussed as having four mirrors. However, the embodiments of thisdisclosure are not limited to these examples and the second stage ofsecond optical pulse stretcher 401 b can include other numbers (forexample four or more) and/or configurations of mirrors. In someexamples, the plurality of mirrors used in the second stage of secondoptical pulse stretcher 401 b are configured to generate twelvereflections of the laser beam between them.

In some examples, the third stage of second optical pulse stretcher 401b is discussed as having four mirrors. However, the embodiments of thisdisclosure are not limited to these examples and the third stage ofsecond optical pulse stretcher 401 b can include other numbers (forexample four or more) and/or configurations of mirrors. In someexamples, the plurality of mirrors used in the third stage of secondoptical pulse stretcher 401 b are configured to generate twelvereflections of the laser beam between them.

According to some embodiments, first optical pulse stretcher 401 a andthe stages of second optical pulse stretcher 401 b are designed suchthat optical delay increases from first optical pulse stretcher 401 a tosecond optical pulse stretcher 401 b. Also, the optical delay of eachstage of second optical pulse stretcher 401 b increases from the firstto the third stage. For example, first optical pulse stretcher 401 a(e.g., the orthogonal optical pulse stretcher) can have an opticaldelay. The first stage of second optical pulse stretcher 401 b can havea first optical delay equal to or greater than the optical delay offirst optical pulse stretcher 401 a. The second stage of second opticalpulse stretcher 401 b can have a second optical delay equal to orgreater than the first optical delay. The third stage of second opticalpulse stretcher 401 b can have a third optical delay equal to or greaterthan the second optical delay. According to some embodiments, theoptical delay can be determined based on the distance that the beamtravels within an optical pulse stretcher.

According to some embodiments, a first stage of second optical pulsestretcher 401 b can have an optical design including two mirrors (e.g.,two lower mirrors of mirrors 501 and 502 in FIG. 3 ) that produce fourreflections of the laser beam between them. Although this example isdiscussed with two mirrors, the first stage of second optical pulsestretcher 401 b can include other numbers of mirrors (for example, twoor more mirrors). These mirrors can be positioned to generate fourreflections of the laser beam between them. In some embodiments, the twomirrors of the first stage of second optical pulse stretcher 401 b canbe separated from each other by a physical distance of about 2 m-4 m.For example, the physical distance can be about 2.5 m to 3.5 m. Thesedistances are provided by way of example only and other distances can beused in other embodiments. In some examples, the first stage of secondoptical pulse stretcher 401 b can be capable of optical pulse stretchinghaving, from example, an optical delay of about 60 ns-80 ns. Forexample, an optical delay of about 65 ns-75 ns. For example, an opticaldelay of about 70 ns-75 ns. It is noted that the example physicaldistance between the two mirrors and the example optical delays provideddo not limit the embodiments of this disclosure. The first stage ofsecond optical pulse stretcher 401 b can be designed such that variousother physical distances and/or various optical delays are achieved.

According to some embodiments, mirrors (e.g., the two lower mirrors ofmirrors 501 and 502) of the first stage of second optical pulsestretcher 401 b can include rectangular concave mirrors. For example,two large rectangular concave mirrors can be used but in otherembodiments other shapes are used. According to some embodiments, thereflective surface of the mirrors can be spherically concave such thatthe distance between the two mirrors (e.g., the surfaces of the twolower mirrors of mirrors 501 and 502) of the first stage of secondoptical pulse stretcher 401 b is equal to (or about equal to) the radiusof the curvature of each of the two mirrors. For example, the mirrorscan be designed and positioned based on a telecentric design. Theconcave mirrors can be designed with orthogonal tip-tilt adjustment andalso Z-axis (e.g., the direction of the propagation of beam) adjustment,according to some embodiments.

According to some embodiments, the first stage of second optical pulsestretcher 401 b can include additional optical elements. In one example,the first stage of second optical pulse stretcher 401 b can include abeam splitter used to split the laser beam and to generate copies of thelaser beam. The beam splitter of the first stage of second optical pulsestretcher 401 b can have a reflectivity of, for example, about 45%-65%.In some examples, the beam splitter can have a reflectivity of about50%-60%. But the embodiments of this disclosure are not limited to theseexamples and various other values of reflectivity can be used. In someexamples, the reflectivity of the beam splitter can depend on and/or becalculated based on the reflectivity of the mirrors used in the firststage of second optical pulse stretcher 401 b.

According to some embodiments, a second stage of second optical pulsestretcher 401 b can have an optical design including four mirrors (e.g.,four middle mirrors of mirrors 501 and 502 in FIG. 3 ) that produce 12reflections of the laser beam between them. Although this example isdiscussed with four mirrors, the second stage of second optical pulsestretcher 401 b can include other numbers of mirrors (for example, fouror more mirrors). These mirrors can be positioned to generate twelvereflections of the laser beam between them. In some embodiments, the twopairs of mirrors of the second stage of second optical pulse stretcher401 b can be separated from each other by a physical distance of about 2m-4 m. For example, the physical distance can be about 2.5 m to 3.5 m.These distances are provided by way of example only and other distancescan be used in other embodiments. In some examples, the second stage ofsecond optical pulse stretcher 401 b can be capable of optical pulsestretching having, from example, an optical delay of about 170 ns-210ns. For example, an optical delay of about 180 ns-190 ns. For example,an optical delay of about 185 ns-195 ns. It is noted that the examplephysical distance between the two pairs of mirrors and the exampleoptical delays provided do not limit the embodiments of this disclosure.The second stage of second optical pulse stretcher 401 b can be designedsuch that various other physical distances and/or various optical delaysare achieved.

According to some embodiments, mirrors (e.g., the four middle mirrors ofmirrors 501 and 502) of the second stage of second optical pulsestretcher 401 b can include rectangular concave mirrors. For example,four large rectangular concave mirrors can be used but in otherembodiments other shapes are used. According to some embodiments, thereflective surface of the mirrors can be spherically concave such thatthe distance between the two pairs of mirrors (e.g., the surfaces of thetwo pairs of middle mirrors of mirrors 501 and 502) of the second stageof second optical pulse stretcher 401 b is equal to (or about equal to)the radius of the curvature of each of the four mirrors. For example,the mirrors can be designed and positioned based on a telecentricdesign. The concave mirrors can be designed with orthogonal tip-tiltadjustment, according to some embodiments.

According to some embodiments, the second stage of second optical pulsestretcher 401 b can include additional optical elements. In one example,the second stage of second optical pulse stretcher 401 b can include abeam splitter (middle beam splitter of beam splitters 503 of FIG. 3 )used to split the laser beam and to generate copies of the laser beam.The beam splitter of the second stage of second optical pulse stretcher401 b can have a reflectivity of, for example, about 45%-65%. In someexamples, the beam splitter can have a reflectivity of about 50%-60%.But the embodiments of this disclosure are not limited to these examplesand various other values of reflectivity can be used. In some examples,the reflectivity of the beam splitter can depend on and/or be calculatedbased on the reflectivity of the mirrors used in the second stage ofsecond optical pulse stretcher 401 b.

Other details concerning optical pulse stretchers can be obtained fromU.S. Pat. No. 7,369,597, titled “Laser Output Light Pulse Stretcher”,issued May 6, 2008, the entire contents of which are hereby incorporatedby reference.

FIG. 4 illustrates a schematic view of part of the paths of laser beamsin second optical pulse stretcher 401 b, according to some embodimentsof the present disclosure.

As illustrated in FIG. 4 , laser beam 601, which is optically stretchedusing the stage of first optical pulse stretcher 401 a enters secondoptical pulse stretcher 401 b. Using first beam splitter 503 a, laserbeam 601 is split into laser beam 603 and laser beam 605. Laser beam 605enters the second stage of second optical pulse stretcher 401 b. Laserbeam 603 enters the first stage of second optical pulse stretcher 401 b,which includes two mirrors. After four reflections from the two mirrors501 a, 502 a of the first stage of second optical pulse stretcher 401 bas shown in FIG. 5A, part of the laser beam enters the second stage ofsecond optical pulse stretcher 401 b by reflecting off beam splitter 503a, the rest of beam will continue to further loops inside the opticalpulse stretcher 400.

Laser beam 605 (and/or the laser beam from the first stage of secondoptical pulse stretcher 401 b) is split into laser beam 607 and laserbeam 609. Laser beam 609 enters the third stage of second optical pulsestretcher 401 b. Laser beam 607 enters the second stage of secondoptical pulse stretcher 401 b, which includes four mirrors 501 c, 501 b,502 b, and 501 c as shown in FIG. 5B. After twelve reflections from thefour mirrors, as indicated by the numbers 1-12, of the second stage ofsecond optical pulse stretcher 401 b part of the laser beam enters thethird stage of enters second optical pulse stretcher 401 b by reflectingoff beam splitter 503 b.

Laser beam 609 (and/or the laser beam from the second stage of thesecond optical pulse stretcher 401 b) is split into laser beam 611 andlaser beam 613. Laser beam 613 is reflected using mirrors 505 a and 505b back to first optical pulse stretcher 401 a. Laser beam 611 enters thethird stage of second optical pulse stretcher 401 b, which includes fourmirrors. After twelve reflections from the four mirrors of the thirdstage of second optical pulse stretcher 401 b, part of the laser beam isreflected toward first optical pulse stretcher 401 a using beam splitter503 c and fold mirrors 505 a and 505 b (FIG. 4 ).

FIG. 6 illustrates a schematic view of part of the paths of laser beamsin second optical pulse stretcher 401 b and parts of mirrors used insecond optical pulse stretcher 401 b, according to some embodiments ofthe present disclosure.

In FIG. 6 , the five mirrors on one side of second optical pulsestretcher 401 b are illustrated. It will be understood that according tosome embodiments an almost symmetric arrangement is also present in thesecond optical pulse stretcher 401 b. In this example, mirror 502 a ofthe first stage of second optical pulse stretcher 401 b is illustrated.A mirror (e.g., mirror 501 a) is on the other side of the first stage ofsecond optical pulse stretcher 401 b, which is not illustrated in thisview. In this example, one pair of mirrors 502 b and 502 c of the secondstage of second optical pulse stretcher 401 b is illustrated. Anotherpair of mirrors (e.g., a pair of mirrors 501 b and 501 c) is on theother side of the second stage of second optical pulse stretcher 401 b,which is not illustrated in this view. Also, in this example, one pairof mirror 502 d and 502 e of the third stage of second optical pulsestretcher 401 b is illustrated. Another pair of mirrors (e.g., a pair ofmirrors 501 d and 501 e) is on the other side of the third stage ofsecond optical pulse stretcher 401 b, which is not illustrated in thisview.

The following discussion is in terms of an arrangement in which theoptical components within the OPuS such as mirrors are arranged in twobanks which are almost left-right symmetric with respect to a centralaxis for the sake of having a concrete example to expedite explanation.It will be appreciated, however, that the principles elucidated hereinmay be applicable to other arrangements so that the specific examplesdescribed herein are not limiting. As sued herein, “almost symmetric”and “substantially symmetric” mean sufficiently symmetric that the OpuScan function for its intended purpose and an image integration module asdescribed below can “see” all of the mirrors simultaneously. Accordingto aspects of an embodiment, in such an arrangement an image integrationmodule is arranged to collect object rays from both the left side opticsand right side optics, which is this example are concave mirrors. Thus,in this arrangement, there are several right-left mirror pairs. A camerasystem including a camera and a lens system is positioned outside thesealed OPuS enclosure. The camera is arranged to collect rays through asealing window which is transparent to light in the visible portion ofthe spectrum, that is, in the range of wavelengths from about 380 toabout 700 nm. The rays produce an image with half of the imageoriginating from left side concave mirror of a mirror pair and the otherhalf of the image originating from the right side concave mirror of themirror pair.

Against this backdrop, the conventional method of aligning the opticalelements in an OPuS is described in connection with FIG. 7 . As seen inFIG. 7 , an OPuS 700 includes an enclosure 710. Within the enclosure 710are positioned for optical elements 720, 730, 740, and 750. Theseoptical elements may be, for example, mirrors. These optical elementsmust be aligned so that an incoming beam strikes the optical elements atthe proper position. To perform this alignment procedure, the enclosure710 is opened and an alignment card 760 is placed adjacent to theposition of the optical surface of one of the optical elements, in thefigure, optical element 750. The optical element is then aligned so thatthe beam falls on the proper position on the alignment card 760. As setforth above, this method entails several disadvantages such as the needto open the enclosure 710 and break purge and the need for an operatorto insert their hands into the enclosure 710 in an open beam situation,which can expose the operator's hands to ultraviolet radiation. It alsoincreases the risk of optical contamination and the resultant decreasein the useful lifetime of the optics.

According to an aspect of an embodiment, as shown in FIG. 8A, an OPuS800 enabling an improved method of alignment includes enclosure 810.Located within the enclosure 810 are optical features 820, 830, 840, and850. Located in a central portion of the enclosure 810 is an imageintegration module 860. As will be described in further detail below,this image integration module 860 collects light from the opticalfeatures and presents the light to a camera 890 through a sealing window870 and a lens 880. In effect, the camera 890 “sees” all of the opticalfeatures within the enclosure 810 at the same time without any need toopen the enclosure 810. This permits continuous observation of thealignment state of the OPuS 800 while avoiding the disadvantages of theprior methods. In some embodiments, the image integration module 860 isplaced as closely to the camera system as possible to maximize theavailable field of view. Elements 835 and 855 are adjustors as will beexplained in more detail below. FIG. 8B shows the placement of the imageintegration module 860 in relation to the arrangement shown in FIG. 5B.Again, the numbers 1-12 indicate the positions of the twelve reflectionsfrom the four mirrors.

FIG. 9A shows a possible implementation of the image integration module860 according to an aspect of an embodiment. As shown, the imageintegration module 860 may be implemented as a pair of mirrored prisms910, 920. The prism 910 is arranged receive light from a region ofinterest 825 including at least one optical feature 820 and redirect thelight as shown out through the sealing window 870. Similarly, the prism920 is arranged to receive light from a region of interest 835 andredirect the light as shown through the sealing window 870. Thus, acamera system including a camera and one or more lenses placed on theother side of the sealing window 870 simultaneously receivesimage-forming light from both the left side region of interest 825 andright side region of interest 835. In other words, the image integrationmodule 860 collects object rays from both left side optical feature andthe right side optical feature. A camera and lens system positionedoutside the sealed OPuS enclosure 820 camera collects the object raysthrough the visible transparent sealing window and produces an image,half of the image being from left side optical feature and the otherhalf being from right side optical feature.

FIG. 9B is a diagram showing the manner in which the image integrationmodule 860 receives light from both the left side region of interest 825containing at least one optical feature and right side region ofinterest 835 containing at least one optical feature and redirects thelight to a position A from which a virtual object 825 a which is animage of the left side region of interest 825 and from which a virtualobject 835 a which is an image of the right side region of interest 835appear to be collocated, that is, positioned side-by-side, so that theycan be viewed simultaneously by a single camera system placed atposition A.

According to an aspect of an embodiment, the image integration module860 may also be implemented using a pair of mirrored surfaces. As anexample, a mirror 950, is shown in FIG. 10 , the other mirror beingplaced substantially symmetrically across axis 970. The conditions for amaximal field of view in such an arrangement are establishedgeometrically also as shown in FIG. 10 . In the figure, h is the heightof the field of interest 960, d is the vertical distance between thecenter of the field to the center of the mirror 950, and s is thehorizontal distance between the field and the mirror 950. The upper partof the figure is the position of a virtual image viewed from below (inthe figure) mirror. The angle θs for a maximal field of view between aline 980 parallel to the field of interest 960 and passing through acenter of the mirror 950 is then given by the relationships:

${\theta 1} = {a{\tan\left( \frac{d}{s} \right)}}$${\theta 2} = {a{\tan\left\lbrack \frac{\frac{h}{2} - \frac{w}{2\sqrt{2}}}{s} \right\rbrack}}$${\theta 3} = \frac{90 - {\theta 1} - {\theta 2}}{2}$

so that the angle θs, which is the angle of inclination of the mirror950 with respect to the optical vertical is given by

${\theta s} = {{{\theta 2} + {\theta 3}} = {\frac{90 - {\theta 1} - {\theta 2}}{2} = {45 + {\left\lbrack {{a{\tan\left\lbrack \frac{\frac{h}{2} - \frac{w}{2\sqrt{2}}}{s} \right\rbrack}} - {a{\tan\left( \frac{d}{s} \right)}}} \right\rbrack/2}}}}$

As mentioned, the image integration module 860 may be implemented in anyone of a number of ways. According to aspects of some embodiments, theimage integration module 860 may be implemented as a pair of prisms 910,920 as shown in FIG. 9A, or as a single prism 1000 with two mirroredsurfaces 1010 and 1020 as shown in FIG. 11A, or as two flat beveledmirrors 1030 and 1040 as shown in FIG. 11B. However, the imageintegration module 860 is implemented, in some embodiments the gapbetween the optical elements or mirrored surfaces is minimized so as notto waste the portion of the field of view lost to gaps as depicted inFIG. 11C. In FIG. 11C the arrow A depicts the field of view from one ofthe optical features, e.g., mirror and the arrow B depicts the field ofview from the other, paired optical feature, and the arrow C depicts thefield of view lost due to the gap between the prisms 910, 920.

FIG. 9A depicts an arrangement in which the light passing through thesealing window 870 travels directly in a straight line to the lenssystem 880. For some embodiments it may be advantageous to interposeadditional optical elements in the path from the sealing window 870 tothe lens system 880. For example, FIG. 12A shows an arrangement in whicha folding mirror 1100 is placed in this path to fold the optical pathand create the possibility of providing more compact arrangements. Inthe arrangement in FIG. 12A the mirror 1100 is positioned within theenclosure to obtain a larger field of view. This arrangement alsoprovides the ability to adjust the image orientation and improvematching of the size and shape of the field and the image sensor in thecamera. FIG. 12B shows an arrangement in which the prisms 910 a, 920 aare partially rotated to fold the optical path. FIG. 12B shows themanner in which the image integration module 860 a receives light fromboth the left side region of interest 825 and right side region ofinterest 835 and redirects the light to a position B from which avirtual object 825 b which is an image of the left side region ofinterest 825 and from which a virtual object 835 b which is an image ofthe right side region of interest 835 appear to be collocated, that is,positioned side-by-side, so that they can be viewed simultaneously by asingle camera system placed at position B. As shown, this arrangementalso provides the ability to adjust the image orientation and improvematching of the size and shape of the field and the image sensor in thecamera.

For some embodiments it may also be advantageous to enhance thevisibility of the region of interest by providing an alignment featureand by using visible (to the camera) light from fluorescence produced byabsorption of ultraviolet light. Using the example of a dichroic mirroras the optical element to be aligned, the mirror in general is supportedby a mirror supporting plate 1300 which includes a support 1310 and atleast one alignment feature 1320. According to some embodiments, asshown in FIG. 13 , a dichroic mirror assembly 1330 includes a substrate1340 which transmits visible light as shown in FIG. 13B and a UVreflective coating 1360 (FIG. 13D). The dichroic mirror assembly 1330 isoverlaid on top of the mirror supporting plate 1300 to produce thesandwich-like structure shown in FIGS. 13C and 13D. UV radiationstriking the dichroic mirror assembly 1330 will create a visible beamfluorescence footprint 1350 in a manner described more fully below. Thefluorescence generated by the ultraviolet radiation and the backalignment feature can be observed by the camera operating in, forexample, the visible spectrum range. By comparing the location of thefluorescence and the alignment feature through the mirror or substratethe system can easily be aligned as described below. While visible lightis used in this example, it will be understood that radiation outside ofthe visible portion of the spectrum may be used.

According to aspects of various embodiments, the illuminated beamfootprint may be generated on exposure to UV in any one of a number ofdifferent ways. For example, as shown in FIG. 14A, the UV reflectivecoating 1360 may be selected to be one that exhibits intrinsicfluorescence properties upon exposure to UV. This is indicated in FIGS.14A-14D with the thick arrow indicating incident UV radiation and thewavy arrows indicating light produced by fluorescence. Alternatively, asshown in FIG. 14B, a back surface of the substrate 1340 may be providedwith a fluorescent coating 1370 with light being generated by leakage ofUV through the reflective coating 1360. The term “back surface” whenreferring to the substrate 1340 means the substrate surface that facesaway from the incoming UV radiation. Alternatively, as shown in FIG.14C, a front surface of the support 1310 may be provided with afluorescent coating 1380 with light being generated by leakage of UVthrough the reflective coating 1360. The term “front surface” whenreferring to the support 1310 means the support surface that faces inthe direction of incoming UV radiation. Alternatively, as shown in FIG.14D, the support 1310 may be made of a fluorescent material with lightbeing generated by leakage of UV through the reflective coating 1360.

FIG. 15A is a plan view of dichroic mirror assembly 1330 overlaid on topof the mirror supporting plate 1300 with alignment feature 1320. Themirror supporting plate 1300 with alignment feature 1320 are shown inphantom as they are behind the dichroic mirror assembly 1330. UVradiation striking the dichroic mirror assembly 1330 creates a visiblebeam fluorescence footprint 1350 as described. In other words, the UVradiation beam will strike the dichroic mirror assembly 1330 at one ormore specific locations as shown, for example, in FIG. 5B. The specificarea struck by the beam will fluoresce as indicated by the fluorescencefootprint 1350. The rest of the surface of the dichroic mirror assembly1330 not struck by the beam will not fluoresce. FIG. 15A shows anunaligned position in which the fluorescence footprint 1350 does notsufficiently coincide with the alignment feature 1320. FIG. 15B shows analigned position in which the fluorescence footprint 1350 doessufficiently coincide with the alignment feature 1320. This isaccomplished by alignment so that the UV beam lands on the dichroicmirror assembly 1330 in correct locations (two in the example) which dueto fluorescence light up and reveal the relative positioning of the UVfootprint and the alignment feature. To correct alignment, theorientation of one or more mirrors is adjusted so that the beam lands inthe correct positions on all of the mirrors. The image of the beamlanding juxtaposed with the alignment feature is captured by the camera,that is, converted to a digital image which an operator can view whileperforming an alignment operation.

According to some embodiments, the alignment of the pulse stretcherrequires that at least some of the mirrors be adjustable, e.g., in thecase of a four mirror arrangement, at least two of the four imagingrelay mirrors be adjustable. Each of the two adjustable mirrors hastip/tilt adjustment creating a total of four degrees of freedom. The twoadjustable mirrors may be located at opposite ends of the OPuS becauseof the confocal design of the system. The adjustable mirrors can also bedesigned with Z-axis (e.g., the direction of the propagation of beam)adjustment, according to some embodiments.

Typically, adjustments on these components to carry out alignment aremade using a through-the-wall adjustor (“TWA”) such as adjustors 855 and835 (FIG. 8A). These involve the use of a hand-manipulated hex driver totip or tilt or translate an optic or module. TWAs may provide a sealedmechanical feed through to certain adjustments, e.g., accessed throughthe covers via a sealed mechanical feed-through. Adjustment can also becarried out with an electrically actuated TWA instead of a manuallyactuated TWA. A motor is mechanically coupled to the TWA. For example,the motor may have a shaft to which a hex adaptor is attached so thatwhen the motor turns the shaft, the hex driver also turns, causing theend of the TWA to translate along its axis according to the direction ofrotation of the shaft. Use of an electrically actuated TWA enablesautomation of the alignment process with the digital images from thecamera 890 being conveyed to the control system 135 (FIG. 1 ) which inturn analyzes the images and actuates the TWAs to carry out alignment.

It should be understood that alignment may entail adjusting only oneoptical feature and that causing the beam to impinge on the proper partof a first optical feature may require adjusting a second opticalfeature optical feature

FIG. 16 is a flow chart showing a process for aligning optical featurespositioned within a sealed enclosure in accordance with aspects ofembodiments. In a step S10 the optical features within the enclosure areexposed to a beam of UV radiation. The beam of UV radiation makes thefootprint of the UV radiation beam visible. In a step S20 the lightgenerated by the UV radiation beam fluorescence is combined into asingle image from the optical features. The single image is conveyedoutside of the enclosed chamber to a camera in a step S30. In a step S40the features are aligned based on the image made from the light combinedfrom the features, either by a technician while viewing the imagecaptured by the camera or by a control system as described above. Inessence, in instances where each of the features includes an alignmentfeature, the alignment is determined based on the positionalrelationship within the image of the beam footprint and the alignmentfeature for each optical feature.

The present invention has been described above with the aid offunctional building blocks illustrating the implementation of specifiedfunctions and relationships thereof. The boundaries of these functionalbuilding blocks have been arbitrarily defined herein for the convenienceof the description. Alternate boundaries can be defined so long as thespecified functions and relationships thereof are appropriatelyperformed.

The foregoing description of the specific embodiments will so fullyreveal the general nature of the present invention that others can, byapplying knowledge within the skill of the art, readily modify and/oradapt for various applications such specific embodiments, without undueexperimentation, without departing from the general concept of thepresent invention. Therefore, such adaptations and modifications areintended to be within the meaning and range of equivalents of thedisclosed embodiments, based on the teaching and guidance presentedherein. It is to be understood that the phraseology or terminologyherein is for the purpose of description and not of limitation, suchthat the terminology or phraseology of the present specification is tobe interpreted by the skilled artisan in light of the teachings andguidance.

Other aspects of the invention are set out in the following numberedclauses:

-   -   1. An optical component comprising:    -   a sealed enclosure, the sealed enclosure including a window        transparent to visible light;    -   a first optical feature positioned at a first position within        the enclosure;    -   a second optical feature positioned at a second position within        the enclosure; and    -   an image integration module arranged to receive first optical        feature light from the first optical feature and second optical        feature light from the second optical feature and adapted to        redirect the first optical feature light and the second optical        feature light through the window to form an image from the first        optical feature light collocated with an image from the second        optical feature light.    -   2. The optical component as in clause 1 wherein the optical        component is an optical pulse stretcher.    -   3. The optical component as in clause 1 wherein the first        optical feature comprises a first mirror and wherein the second        optical feature comprises a second mirror.    -   4. The optical component as in clause 3 wherein the first mirror        comprises a first concave dichroic mirror and wherein the second        mirror comprises a second concave dichroic mirror.    -   5. The optical component as in clause 1 wherein the first        optical feature and the second optical feature are positioned        substantially symmetrically with respect to the image        integration module.    -   6. The optical component as in clause 1 wherein the image        integration module comprises a first reflective surface arranged        to redirect light from the first optical feature and a second        reflective surface arranged to redirect light from the second        optical surface.    -   7. The optical component as in clause 6 wherein the first        reflective surface comprises a first prism reflective surface of        a first prism and wherein the second reflective surface        comprises a second prism reflective surface of a second prism.    -   8. The optical component as in clause 1 wherein the image        integration module comprises a prism having a first reflective        surface oriented toward the first optical feature and a second        reflective surface oriented toward the second optical feature.    -   9. The optical component as in clause 1 wherein the image        integration module comprises two flat beveled mirrors.    -   10. The optical component as in clause 1 further comprising:    -   a third optical feature positioned at a third position within        the enclosure; and    -   a fourth optical feature positioned at a fourth position within        the enclosure;    -   wherein the image integration module is arranged to receive        third optical feature light from the third optical feature and        fourth optical feature light from the fourth optical feature and        adapted to combine and redirect the third optical feature light        and the fourth optical feature light through the window to form        an image from the third optical feature light collocated with an        image from the fourth optical feature light.    -   11. The optical component as in clause 1 further comprising a        camera system arranged to receive the first optical feature        light and the second optical feature light through the window.    -   12. The optical component as in clause 11 wherein the camera        system comprises    -   a lens system arranged to receive the first optical feature        light and the second optical feature light through the window        and    -   a camera arranged to receive the first optical feature light and        the second optical feature light from the lens system.    -   13. The optical component as in clause 11 further comprising a        folding mirror optically positioned between the image        integration module and the window for turning an optical path of        the first optical feature light and the second optical feature        light.    -   14. The optical component as in clause 1 wherein at least one of        the first optical feature and the second optical feature is        adjustable, and further comprising an actuator mechanically        coupled to the at least one of the first optical feature and the        second optical feature to adjust an orientation of the at least        one of the first optical feature and the second optical feature.    -   15. The optical component as in clause 1 wherein the first        optical feature comprises a first fluorescent material and a        first alignment feature and wherein the second optical feature        comprises a second fluorescent material and a second alignment        feature.    -   16. The optical component as in clause 1 wherein    -   the first optical feature comprises a first mirror comprising a        first substrate transparent to visible light and first        reflective coating that is reflective to UV radiation and a        first mirror support, and wherein the second optical feature        comprises a second mirror comprising a second substrate        transparent to visible light and second reflective coating that        is reflective to UV radiation and a second mirror support.    -   17. The optical component as in clause 16 wherein the first        mirror support comprises a first alignment feature on a front        surface of the first mirror support and wherein the second        mirror support comprises a second alignment feature on a front        surface of the second mirror support.    -   18. The optical component as in clause 17 wherein the first        alignment feature corresponds to a position of an aligned beam        footprint on the first mirror and wherein the second alignment        feature corresponds to a position of an aligned beam footprint        on the second mirror.    -   19. The optical component as in clause 18 wherein the first        optical feature further comprises a first fluorescent material        and wherein the second optical feature further comprises a        second fluorescent material.    -   20. The optical component as in clause 19 wherein the first        optical feature comprises a first reflective coating including        the first fluorescent material and wherein the second optical        feature comprises a second reflective coating including the        second fluorescent material.    -   21. The optical component as in clause 19 wherein the first        fluorescent material is provided on a back surface of the first        substrate and wherein the second fluorescent material is        provided on a back surface of the second substrate.    -   22. The optical component as in clause 19 wherein the first        fluorescent material is provided on a front surface of the first        mirror support and wherein the second fluorescent material is        provided on a front surface of the second mirror support.    -   23. The optical component as in clause 19 wherein the first        mirror support comprises the first fluorescent material and        wherein the second mirror support comprises the second        fluorescent material.    -   24. An optical component comprising:    -   a sealed enclosure, the sealed enclosure including a window        transparent to visible light;    -   a first optical feature positioned within a first field of view        within the enclosure;    -   a second optical feature positioned within the first field of        view within the enclosure; and    -   an image integration module arranged to receive first field of        view light from the first field of view and adapted to combine        and redirect the first field of view light through the window,        wherein    -   the image integration module comprises a planar mirrored surface        inclined with respect to a line passing through a center of the        planar mirrored surface and substantially parallel to the first        field of view by an angle θ given by the relationship

$\theta = {45 + {\left\lbrack {{a{\tan\left\lbrack \frac{\frac{h}{2} - \frac{w}{2\sqrt{2}}}{s} \right\rbrack}} - {a{\tan\left( \frac{d}{s} \right)}}} \right\rbrack/2.}}$

where h is a height of the first field of view, d is a vertical distancebetween the center of the first field of view to the center of theplanar mirrored surface, and s is a horizontal distance between thefirst field of view and the center of the planar mirrored surface.

-   -   25. A method of aligning a plurality of optical features        arranged in sealed enclosure having a window, the method        comprising:    -   combining light from each of the optical features to produce a        combined light signal;    -   directing the combined light signal out of the enclosure through        the window; and    -   aligning at least some of the plurality of optical features        based at least in part on the combined light signal.    -   26. The method as in clause 25 further comprising imaging the        combined light signal after directing the combined light signal        out of the enclosure through the window using a camera system        positioned outside of the sealed enclosure and arranged to        receive the combined light signal.    -   27. The method as in clause 25 wherein each of the plurality of        optical features comprises an alignment feature and a        fluorescent material arranged to generate a visible footprint of        a UV beam impinging on the optical feature and further        comprising, before combining light from each of the optical        features to produce a combined light signal,    -   exposing each of the optical features to a beam of UV radiation,        and    -   generating an illuminated footprint of the beam of UV radiation        on each of the optical features,    -   wherein aligning at least some of the plurality of optical        features based at least in part on the combined light signal        comprises aligning at least some of the plurality of optical        features based at least in part on a positional relationship of        the illuminated footprint and the alignment feature for each        optical feature.    -   28. The method as in clause 25 wherein aligning comprises        adjusting one or more of the plurality of optical features.    -   29. The method as in clause 28 wherein adjusting one or more of        the plurality of optical features comprises manually operating        one or more actuators respectively mechanically coupled to the        one or more of the plurality of optical features.    -   30. The method as in clause 28 wherein adjusting one or more of        the plurality of optical features comprises supplying a signal        to actuate one or more motor driven actuators respectively        mechanically coupled to the one or more of the plurality of        optical features.    -   31. The method as in clause 28 wherein adjusting one or more of        the plurality of optical features comprises adjusting an        orientation of one or more of the plurality of optical features.

1. An optical component comprising: a sealed enclosure, the sealedenclosure including a window transparent to visible light; a firstoptical feature having a first region positioned within the enclosure; asecond optical feature having a second region positioned within theenclosure; and an image integration module arranged to receive firstregion light from the first optical feature and second region light fromthe second optical feature and adapted to cause the first opticalfeature light to propagate parallel to the second optical feature lightthrough the window, wherein the image integration module comprises aplanar mirrored surface inclined with respect to a line passing througha center of the planar mirrored surface and substantially parallel tothe first region feature by an angle θ.
 2. The optical component ofclaim 1 wherein the angle θ is selected to maximize a field of view ofthe image integration module.
 3. The apparatus of claim 1 wherein theangle θ is given by$\theta = {45 + {\left\lbrack {{a{\tan\left\lbrack \frac{\frac{h}{2} - \frac{w}{2\sqrt{2}}}{s} \right\rbrack}} - {a{\tan\left( \frac{d}{s} \right)}}} \right\rbrack/2.}}$where h is a height of the first region, d is a vertical distancebetween the center of the region to the center of the planar mirroredsurface, s is a horizontal distance between the first region and thecenter of the planar mirrored surface, and w is a width of the planarmirror surface.
 4. A method of aligning a first optical feature arrangedat a first position in a sealed enclosure and a second optical featurearranged at a second position in the sealed enclosure, the sealedenclosure having a window, the method comprising: receiving light fromthe first optical feature; receiving light from the second opticalfeature; and redirecting the light from the first optical feature andthe light from the second optical feature out of the sealed enclosurethrough the window and forming a composite image comprising a firstimage from the light from the first optical feature collocated with asecond image from the light from the second optical feature.
 5. Themethod of claim 4 further comprising capturing the composite image usinga camera system positioned outside of the sealed enclosure and arrangedto receive the composite image.
 6. The method of claim 4 furthercomprising aligning at least one of the first optical feature and thesecond optical feature based at least in part on the composite image. 7.The method of claim 6 wherein the first optical feature includes firstfluorescent material arranged to generate a visible footprint of anultraviolet beam impinging on the first optical feature and the secondoptical feature comprises second fluorescent material arranged togenerate a visible footprint of an ultraviolet beam impinging on thesecond optical feature and further comprising, before forming thecomposite image, exposing the first fluorescent material of the firstoptical feature to a beam of ultraviolet radiation to generate a firstilluminated footprint of the beam of ultraviolet radiation on the firstoptical feature; and exposing the second fluorescent material of thesecond optical feature to a beam of ultraviolet radiation to generate asecond illuminated footprint of the beam of ultraviolet radiation on thesecond optical feature; and exposing each of the first and secondoptical features to a beam of ultraviolet radiation generating anilluminated footprint of the beam of ultraviolet radiation on each ofthe optical features, wherein aligning at least one of the first opticalfeature and the second optical feature based at least in part on thecomposite image comprises aligning at least one of the first and secondoptical features based at least in part on a positional relationship ofthe first illuminated footprint and the first optical feature and apositional relationship of the second illuminated footprint and thesecond optical feature.
 8. The method of claim 6 wherein aligningcomprises adjusting at least one of the first and second opticalfeatures.
 9. The method of claim 8 wherein adjusting at least one of thefirst and second optical features comprises operating one or moreactuators respectively mechanically coupled to the at least one of thefirst and second optical features.
 10. The method of claim 8 whereinadjusting the at least one of the first and second optical featurescomprises supplying a signal to actuate one or more motor drivenactuators respectively mechanically coupled to the at least one of thefirst and second optical features.
 11. The method of claim 8 whereinadjusting the at least one of the first and second optical featurescomprises adjusting an orientation of the at least one of the first andsecond optical features
 12. The method of claim 4 wherein the firstoptical feature, the second optical feature, and the sealed enclosureare parts of an optical pulse stretcher.
 13. A system comprising: afirst optical feature arranged at a first position in a sealedenclosure, the sealed enclosure having a window; a second opticalfeature arranged at a second position in the sealed enclosure; and adetector comprising a camera disposed outside of the sealed enclosure,wherein, the camera is configured to receive, through the window, lightfrom the first optical feature, the camera is configured to receive,through the window, light from the second optical feature, and thedetector is configured to form a composite image comprising a firstimage from the light from the first optical feature collocated with asecond image from the light from the second optical feature.
 14. Thesystem of claim 13 further comprising an actuator mechanically coupledto least one of the first optical feature and the second optical featureand responsive to a control signal to alter an orientation of the leastone of the first optical feature and the second optical feature.
 15. Thesystem of claim 13 wherein the first optical feature includes firstfluorescent material arranged to generate a visible footprint of anultraviolet beam impinging on the first optical feature and the secondoptical feature comprises second fluorescent material arranged togenerate a visible footprint of an ultraviolet beam impinging on thesecond optical feature and further comprising, before forming thecomposite image.